Molecular Vapor Deposition (MVD®) was invented to help semiconductor manufacturers grow ultra-thin, functionalized, organic and inorganic films with higher yields and better cost efficiencies than traditional liquid deposition techniques. Such films serve as lubricant, protective, hydrophobic, hydrophilic, biocompatible, or reactive coatings. In MEMS applications, for example, MVD-films are typically used as anti-stiction coatings to improve device performance, and enhance overall device lifetime.
MVD process technology deposits ultra-thin films by vapor deposition at low temperatures on a broad spectrum of substrates. It’s the only deposition technology of its kind. A highly flexible system that can run both ALD-like and CVD-like processes, the platforms feature optional integrated plasma generation for substrate conditioning. MVD platforms allow for the use of up to four precursors, and can process multiple wafers or other three-dimensional objects in a single batch. It delivers extremely high conformality on aggressive aspect ratios of up to 2000:1.
Benefits of MVD® for MEMS Production
With MVD, manufacturers can achieve exceptional film uniformity with industry-leading reliability — advantages that maximize manufacturing yields and reduce overall costs. Device performance is also greatly improved, especially in many MEMS applications. For example, with MVD-deposited anti-stiction films, failure rates for microphones shrank from 14 percent to 0.4 percent, while the failure rate for accelerometers dropped from 40 percent to less than 5 percent.
The MVD platform is versatile, easy-to-use and highly scalable. In addition, the learning curve is light, which is a benefit valued by customers who deploy the system for multiple applications. The ultra-low cost-of-ownership is due to the tool’s inherent efficiencies, and further enabled by its very low precursor consumption. Also, by consuming only milligram levels of precursor per run, and requiring nearly zero point-of-use exhaust treatment, it’s greener than most other CVD deposition techniques.
MVD is a superior alternative to traditional methods for growing ultra-thin protective films. With feature sizes shrinking faster than the pace of progress for conventional deposition tools, MVD presents a completely new approach. Unburdened by legacy technologies, the platform has been engineered by our team of thin-film deposition experts and built specifically to meet the aggressive performance specs for today’s advanced devices.
Beyond MEMS, other important applications benefit from MVD. In advanced packaging applications for example, MVD films are used as moisture barriers for polymers, as well as oxidation and corrosion barriers on metals. In inkjet applications, MVD films can prevent ink accumulation on the nozzle face plate to optimize ink flow. In bio-MEMS, MVD films improve wetting and/or prevent protein adsorption. In biotechnology applications, MVD films are used to create surface anchors for biomolecule reactions. In nano-imprint lithography, MVD films are used as very thin and conformal release layers between the stamp and polymer materials.