LPCVD/Diffusion

SPTS offers a variety of large batch thermal processes for memory and logic applications on 150, 200 and 300mm wafers.

Extensive process solutions for LPCVD/diffusion applications

  • Gate oxides
  • Nitrides for gates and spacers
  • TEOS spacers and liners
  • Phosphorus (P)-and arsenic (As)-doped polysilicon
  • Radical oxides
  • High Temperature Anneals
  • Spin-on-glass low pressure anneal
  • Gate and pad oxide
  • Cu anneal highly uniform wet/ dry oxides
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