LPCVD/Diffusion

SPTS’ large batch vertical furnace products offer low temperature anneal solutions ideally suited to high-volume advanced packaging applications.

 

Benefits of SPTS LPCVD/Diffusion for Advanced Packaging:

  • Thermal processes for interposer TSV
    • Wet thermal oxide for Si via liner with high conformity and oxide integrity
    • Low temperature metal anneals with excellent control of sheet resistance (Rs) and low CoO
  • High yield anneals for e-WLB
    • Controlled film shrinkage and bow
    • Low O2 environment prevents Al or Cu oxidation

 

Uniformity of thick thermal oxide Accurate low temp anneal
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