XeF2 Release Etch

Xactix® XeF2 Release Etch Systems

Isotropic etching of silicon using xenon difluoride is an ideal solution for releasing MEMS devices. XeF2 shows high selectivity to silicon over almost all standard semiconductor materials including photoresist, silicon dioxide, silicon nitride and aluminum. Being a vapor phase etchant, XeF2 avoids many of the problems typically associated with wet or plasma etch processes.  



SPTS offers the following Xactix® xenon difluoride etching systems:

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