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Filmetrics® Thin-Film Thickness Measurement Systems

Sample on a thin-film thickness measurement instrument

Filmetrics® Thin-Film Thickness Measurement Systems

The Filmetrics® F-Series reflectometers deliver high-precision thin-film thickness measurements in seconds. These easy-to-use, affordable thickness measurement tools, combined with intelligent software and a broad range of accessories and configurations, provide maximum versatility in film thickness measurements ranging from 1nm to 3mm.

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Single-Spot Thickness Measurement Systems

Benchtop systems for measuring film thickness and refractive index of a thin film with a single mouse-click. Measure thicknesses of thin films from 1nm - 3mm - even within multilayer film stacks.

Filmetrics F20

Filmetrics® F20 Series Film Thickness Measurement Instruments

Our most popular general-purpose benchtop film thickness, refractive index, and optical property measurement system.

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Filmetrics F3-sX film thickness measurement system

Filmetrics® F3-sX Film Thickness Measurement Series

Utilizes near infra-red (NIR) light for the thickness measurement of rough and less uniform semiconductor and dielectric layers up to 3mm thick.

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Filmetrics F3-CS measurement system

Filmetrics® F3-CS Measurement System

Small, portable tool designed for the measurement of coating thickness on small witness samples, such as parylene-coated coupons.

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Filmetrics F10-ARc portable reflectometer

Filmetrics® F10-ARc

Portable reflectometer with internal fiber optics to measure curved surfaces including anti-reflection coatings with a patented long-life, low-power light source. Get color, reflectance, and thin-film thickness measurements in seconds at a fraction of the price.

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Filmetrics F10-HC hardcoat thickness measurement instrument

Filmetrics® F10-HC

Relied on by automotive hardcoat companies around the world to measure hardcoat thickness on flat and curved surfaces. The F10-HC is based on the F20 platform where analysis of spectral reflectance data provides thin-film thickness measurement results quickly.

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Filmetrics F10-AR coating measurement instrument

Filmetrics® F10-AR

Measures reflectance of ophthalmic lenses and other curved surfaces. Options available for transmittance and hardcoat thickness measurement.

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Microscopic-Spot Thickness Measurement Systems

Film thickness measurement instrument used when a measurement spot as small as 1µm is required - use your own microscope as a metrology tool or let us supply the entire thin-film measurement system. Obtain measurements on patterned wafers, curved, and rough surfaces.

Filmetrics F40 film thickness measurement instrument

Filmetrics® F40 Film Thickness Measurement Instrument

Attaches to your microscope to measure thickness and index in spots as small as 1µm in patterned, curved, and non-uniform samples.

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Automated Thickness Mapping Systems

Automated system for mapping a topographical map of a thin film's surface. Uniformity testing ensures film thickness and refractive index for nearly any sample shape.

Filmetrics F50 and chuck

Filmetrics® F50 Automated Film Thickness Mapper

Adds automated mapping capabilities to our F20 family of products. Map thickness and index as fast as two points per second.

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Filmetrics F54 film thickness measurement mapping instrument

Filmetrics® F54 Film Thickness Measurement Mapping Instrument

Maps thin-film thickness of samples up to 450mm in diameter as fast as two points per second.

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Filmetrics F54-XY film thickness measurement mapping instrument

Filmetrics® F54-XY-200 and F54-XY-300 Film Thickness Measurement Mapping Instruments

Maps thin-film thickness of patterned or unpatterned samples up to 200mm x 200mm, or up to 300mm round, as fast as two points per second.

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Filmetrics F60-t film thickness mapping instrument

Filmetrics® F60-t Film Thickness Mapping Instrument for Production Environments

Production-ready tabletop thickness mapping system includes on-board reflectance standard, notch finding, interlocked cover, and more.

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Filmetrics F60-c film thickness mapping instrument

Filmetrics® F60-c Automated Film Thickness Mapper

The F60-c is a fully automated cassette-to-cassette metrology system for measuring film thickness on unpatterned production or monitor wafers. Seven configurations cover film thickness from 5nm up to 3mm.

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Inline Thickness Monitoring Systems

Monitor and control thickness of moving films during production. Sample rates as high as 100Hz are possible at multiple measurement locations. Multi-point monitoring allows for monitoring thickness at the left, center, and right to ensure "cross-web" uniformity.

Filmetrics F32

Filmetrics® F32 In-Line Thickness Measurement System

Measures deposition rate, film thickness, optical constants and uniformity in real time, with the capability to measure up to 4 spots simultaneously.

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Frequently Asked Questions

  • How do you measure the thickness of a thin film?

    Thin-film and coating thickness can be measured using optical techniques such as spectral reflectance (reflectometry) or interferometry, or with stylus techniques that measure the step height of the film. Modern systems can measure films ranging from a few nanometers to several millimeters, depending on the technology used.

  • What instrument is used to measure the thin-film thickness?

    Several types of instruments can measure thin-film thickness, depending on the film and application. KLA Instruments offers the F Series spectral reflectometers for non-contact optical thin-film thickness measurement. Zeta™ 3D optical profilers with the ZFT option may also be used. The Tencor® and Alpha-Step® stylus profilers measure film thickness by measuring the profile at a step, which is the preferred method for opaque or thicker films.

  • How do optical thin-film measurement systems work?

    Optical systems illuminate the film and analyze the reflected light. Reflections from the film surface and substrate interface create interference patterns. By modeling the reflected spectrum, the film thickness can be calculated accurately.

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  • How do I choose the right thin-film thickness measurement tool for my application?

    Choosing the right thin-film thickness measurement tool depends on the film structure, sample type, required measurement range, and workflow. Key considerations include:

    • Thickness range
    • Required throughput
    • Single-point vs. wafer mapping
    • Spot-size requirements
    • Patterned vs. unpatterned samples
    • Need for n&k measurements
    • Production vs. R&D environment
  • What thin-film thickness ranges can be measured?

    Measurement range varies by instrument, film material, and application. KLA F Series spectral reflectometers provide measurement capabilities for layer thickness from approximately 1nm up to several millimeters, depending on the system and its optical configuration.

  • What types of films can be measured?

    • Oxides
    • Nitrides
    • Photoresist
    • Optical coatings
    • Semiconductor films
    • Transparent dielectric films
    • Multilayer stacks
    • Medical and industrial coatings

    The exact measurement capability depends on the optical properties of the material.

  • Can transparent films be measured?

    Yes. Transparent and translucent films are among the most common applications for reflectometry-based thin-film thickness measurement systems.

  • Can multilayer film stacks be measured?

    Yes. Many optical thin-film measurement systems can measure multilayer film stacks, provided the individual layers have sufficient optical contrast and an appropriate optical model is available. The number of layers and properties that can be determined depends on the film stack, thickness ranges, optical constants, and measurement system.

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  • Can film thickness and refractive index be measured at the same time?

    Yes. Many thin-film reflectometry systems can determine both film thickness and refractive index (n) when the film is thick enough and sufficient spectral information is available. Some configurations can also characterize extinction coefficient (k). Measurement capability depends on film thickness, material properties, wavelength range, and the amount of independent information available in the measured spectrum.

  • What is the difference between reflectometry and ellipsometry?

    Reflectometry measures the intensity of light reflected from a thin-film structure as a function of wavelength and uses the resulting spectrum to determine film thickness and, in some cases, optical properties. It is often preferred for fast, straightforward measurements and high-throughput applications.

    Ellipsometry measures changes in the polarization of reflected light, typically using light incident at an oblique angle. It can provide highly sensitive characterization of thin films, multilayer structures, and optical properties such as refractive index and extinction coefficient.

  • How accurate are thin-film thickness measurements?

    Thin-film thickness measurement depends on the film properties, thickness range, optical constants, calibration, and instrument configuration. Some reflectometry-based systems specify nanometer-level resolution and accuracy for suitable samples.

  • Can patterned wafers be measured?

    Yes. Specialized systems such as the Filmetrics® F54-XY are designed for patterned wafers and use microscopy optics, autofocus and small spot sizes to measure structures within patterned devices.

  • Can thickness uniformity be mapped across a wafer?

    Yes. Automated mapping systems can generate thickness-uniformity maps across wafers and large-area substrates using predefined or custom measurement patterns. The Filmetrics® F50, F54, F54-XY, F60-t and F60-c all provide mapping capabilities for generating film thickness uniformity data. Pre-defined or custom patterns can be used.

  • What is the smallest measurement spot size available?

    Depending on the instrument configuration, spot sizes can be as small as approximately 1µm for microscopic measurements.

  • What information is required before measuring a film?

    The information required depends on the measurement method and film stack, but a thin-film measurement recipe typically includes:

    • Film material
    • Substrate material
    • Expected thickness range
    • Layer structure
    • Optical constants (if available)

    The measurement model then uses this information to calculate thickness accurately.

  • What are the limitations of optical film-thickness measurement?

    Optical thin-film measurement performance can depend on:

    • Film transparency (as thickness increases, the film may eventually become opaque)
    • Surface roughness (rougher surfaces scatter more light, affecting signal-to-noise)
    • Optical contrast between layers
    • Knowledge of material optical constants
    • Multilayer complexity
  • How long does a thin-film thickness measurement take?

    Many benchtop reflectometry measurements can be performed in less than a second, while automated mapping applications require additional time depending on the number of measurement sites and whether pattern recognition is used to automatically locate the individual sites.

  • Can thin-film thickness measurements be made in production environments?

    Yes. Many systems are designed for manufacturing with automation features such as wafer mapping, recipe control, automation interfaces, and process monitoring. The Filmetrics® F60-c is fully automated with cassette-to-cassette loading.

  • What industries use thin-film thickness measurement tools?

    Thin-film thickness measurement is used for process development, quality control, and production monitoring across industries including:

    • Semiconductors
    • MEMS
    • Optical coatings
    • Displays
    • Power devices
    • Compound semiconductors
    • Medical devices
    • Photonics
    • Data storage
  • What is the difference between the Filmetrics F20, F40, F50, F54, and F60 platforms?

    Tool Typical Use
    F10/F20 General-purpose single spot thin-film measurements
    F32 In situ single spot thin-film measurements
    F40 Microscope-based measurement with spot sizes down to ~1µm
    F50/F54 Automated thickness mapping
    F54-XY Patterned wafer and advanced mapping applications
    F60 Automated, fab-oriented thickness mapping and production use
  • How many measurement points can be collected on a wafer?

    Automated mapping systems support user-defined measurement patterns and can collect large numbers of points across a wafer for process monitoring and statistical analysis. There is no upper limit to the number of measurement points on the sample.

  • How do I get started with KLA thin-film thickness measurement?

    Fill out this inquiry form to get the process started, and one of our applications or sales representatives will contact you to discuss your applications requirements and answer any initial questions on pricing and lead times. A quote can be sent to you at this time, or you may wish to schedule a demo, either in-person or by sending samples for measurement. If a demo is completed, the report will be generated for you, after which you can decide how you would like to move forward.

  • What happens once I place an order?

    Once an order is placed, your salesperson will keep you apprised of delivery schedule. Some maintenance (such as calibration) can be performed by you, and a maintenance schedule is provided/coordinated by the KLA Service team. To order new or replacement lamps or other accessories, please visit our online store or contact your sales representative. For questions that may arise as you are using the tool, our global Applications Team can provide assistance.

Technical Literature

Browse application notes and technical papers from KLA Instruments Application Engineers and customers, covering a variety of use cases for KLA Instruments products.

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Timeline of Innovation

Starting with the launch of the first thin-film measurement instrument in 1995, Filmetrics technical experts have continued to produce key innovations such as AutoBaseline™, pattern recognition using the film thickness image, and built-in automatic wavelength calibration. For over two decades, the innovative technology and unparalleled application support offered by Filmetrics has provided customers with repeatable and trustworthy measurements for thin-film metrology. Learn more about the rich history of innovation and see why Filmetrics reflectometers are the standard in thin-film measurement.

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