Primaxx® HF 释放蚀刻

干法HF气相腐蚀工艺去除牺牲氧化层

SPTS提供应用最为广泛的干法HF蒸汽释放产品,从用于研发的实验室系统到用于大批量生产的多腔体工艺平台。业界领先的Primaxx®HF蒸汽蚀刻释放技术可用于去除牺牲氧化硅层,主要用于释放MEMS器件中的微结构。

我们专有的干法工艺避免了释放的运动部件的粘连问题和对精密结构的损坏,这是传统湿法加工技术通常存在的问题。

在减压和高温下结合无水HF蒸汽和乙醇蒸汽提供了一个宽而稳定的工艺窗口,可以处理不同的氧化物成分和厚度,同时保持对MEMS设计中其他常见材料的高选择性,包括暴露的铝合金结构,例如微镜和焊盘。

Primaxx® Monarch300

Primaxx® Monarch300

The Primaxx® Monarch300 is a fully integrated, automated VHF etch tool designed to perform selective MEMS etch release via a controlled...

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Primaxx® Monarch 25

Primaxx® Monarch 25

The Monarch25 is a 25-wafer batch process module designed for medium to high volume HF release etch production applications in either the...

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Primaxx® Monarch 3

Primaxx® Monarch 3

The Monarch 3 is a compact module includes a 3-wafer process chamber, and is designed for research laboratory and small volume production...

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Primaxx® uEtch

Primaxx® uEtch

SPTS's uEtch is a single-wafer system specifically designed for university and small research laboratories. Fully integrated,...

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