PECVD

等離子體增強化學氣相沉積(PECVD)是一種利用等離子內的能量在晶片表面引發反應的工藝,否則該反應將需要與常規CVD相關的更高溫度。沉積過程中的高能離子轟擊還可以改善薄膜的電子和機械性能。
Delta沉積系統

SPTS的Delta PECVD

系統可用於微機電,化合物半導體和高級封裝行業中的廣泛應用,尤其是在需要低處理溫度的應用中。

Delta® PECVD

Delta® PECVD

The Delta® PECVD systems are used for a wide range of applications within MEMS, compound semiconductors, and advanced...

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