Delta® Deposition Systems
The Delta® PECVD systems are used for a wide range of applications within MEMS, compound semiconductors, and advanced packaging
Key Benefits
- Wafer sizes from 75mm to 300mm
- Radially symmetrical gas flow for superior wafer-in-wafer (WIW) uniformity
- Up to 10 gas lines and optional on-board liquid delivery system
- Mixed frequency plasma capability for stress tuning
- Active platen cooling for critical, low temperature [<175°C] packaging applications
- Single and multi-wafer preheat chamber options for de-gassing sensitive substrates