Delta® Deposition Systems

The Delta® PECVD systems are used for a wide range of applications within MEMS, compound semiconductors, and advanced packaging

Key Benefits

  • Wafer sizes from 75mm to 300mm
  • Radially symmetrical gas flow for superior wafer-in-wafer (WIW) uniformity
  • Up to 10 gas lines and optional on-board liquid delivery system
  • Mixed frequency plasma capability for stress tuning
  • Active platen cooling for critical, low temperature [<175°C] packaging applications
  • Single and multi-wafer preheat chamber options for de-gassing sensitive substrates

Markets Served by PECVD:

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