"Analysis and Management of the Effects of Fluorinated Gases during Plasma Dicing" Janet Hopkins et al

(IMAPS-DPC 2021)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Optimization of Low Temperature PECVD Dielectric Stacks for Via Reveal Passivation" K. Crook etc al

(IWLPC 2020)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Extreme Wafer Thinning and nano-TSV processing for 3D Heterogeneous Integration" Anne Jourdain et al

(ECTC2020)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Exploring the Challenges of Gallium Arsenide Plasma Dicing" M. Day et al

(CSMantech 2020)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Improved Semiconductor Device Reliability from Plasma Dicing" R. Barnett et al

(IWLPC 2019)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Fan-Out Wafer Processing in the High Density Packaging Era" David Butler et al

(IWLPC 2018)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Plasma Dicing: Reducing the cost of singulating thinner, smaller die" O. Ansell

(iMAPS MINAPAD 2017)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Plasma Dicing 300mm Framed Wafers - Analysis of Improvement in Die Strength and Cost Benefits for for Thin Die Singulation" M. Blair

(ECTC 2017)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Impact of Backside Processing on C-V Characteristics of TSV Capacitors in 3D stacked IC Process flows" J. de Vos et al

(EPTC 2015)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Improving device yields and throughput using plasma dicing" R. Barnett et al

(IWLPC 2015)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Comparison between wet and dry silicon via reveal in 3D backside processing" D. Thomas et al; SPTS/imec joint paper

(IWLPC 2015)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Wafer-to-Wafer Metal Sputter Deposition Process Control by Automatic Deposition Rate Adjustment" C. Weng et al

(CS Mantech 2015)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Extending Capabilities of Etch and Deposition Technologies for 3D Packaging of MEMS in Volume Production" C Short et al

(IWLPC2014)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Advances in Etch and Deposition Technologies for 2.5 and 3D BEOL Processing" K Buchanan et al

(SMTA Pan Pacific Symposium Conference 2014)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Claritas™ – A unique and robust endpoint technology for silicon DRIE processes with open area down to 0.05%" O. Ansell et al

(MEMS2014)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Considerations and Benefits of Plasma Etch Based Wafer Dicing" R. Barnett et al

(EPTC 2013)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Advances in Back-side Via Etching of SiC for GaN Device Applications" A. Barker et al

(CS Mantech 2013)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Dielectric Stack Engineering for Via-Reveal Passivation" K. Crook et al.

(ECTC 2013)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Low Temperature Dielectric Deposition for Via-Reveal Passivation" K. Crook et al.

(EMPC 2013)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Plasma Etch and Low Temperature PECVD Processes for Via Reveal Applications" D. Thomas et al

(ECTC 2012)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"3D Multi-stacking of Thin Die based on TSV and Micro-inserts Interconnections" J. Souriau et al.

(ECTC 2012)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Refractive Index Graded Anti-reflection Coating for Solar Cells Based on Low Cost Reclaimed Silicon" Y. Liu et al.

(MNE 2012)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Advanced Deep Reactive-Ion Etching (DRIE) Technology for Hollow Microneedles for Transdermal Blood Sampling and Drug Delivery" Y. Liu et al.

(MNE 2011)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"Yield and Productivity Improvements Through Use of Advanced Dual Plasma Source for TSV Reveal & Wafer Dicing Applications" R. Barnett et al.

(EPTC 2011)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download

"300mm Scaling of Critical Silicon Etches for Image Sensor Wafer-Level Packaging Based on Tessera’s MVP (TSV) Technology" D.Thomas et al.

(IMAPS Device Packaging 2011)

Please fill out the following details to receive a link to your download.

Please confirm that you have read and agree to the privacy policy

Privacy Policy

×
Download