Plasma Etch

Plasma etching involves RF-excitation of a selected gas mixture to create a plasma with the right reactive species to etch any un-masked areas on the wafer surface. The reactions form volatile by-products which are removed by vacuum pumping.

Omega® Etch Systems

SPTS offers advanced etch technologies for a wide range of applications within:

Omega® Rapier / DSi / DSi-v

Omega® Rapier / DSi / DSi-v

With an installed base of >1200 DRIE process modules, SPTS’s industry-leading position is spearheaded by the Rapier module, which etches Si using...

阅读更多
Omega® ICP

Omega® ICP

SPTS ICP process module is highly flexible and etches a wide range of materials including oxides, nitrides, polymers, low aspect ratio Si and...

阅读更多
Omega® Synapse™

Omega® Synapse™

Omega® Synapse™...

阅读更多

Inquiry about: Plasma Etch

Please provide your name
Please provide your name
Please provide your email address
Please provide your telephone number
Please provide your job title
Please provide your company name
Please enter your message
Please confirm that you have read and agree to the privacy policy

Privacy Policy

×