Omega® Rapier / DSi / DSi-v
With an installed base of >1200 DRIE process modules, SPTS’s industry-leading position is spearheaded by the Rapier module, which etches Si using...
Plasma Etch
Plasma etching involves RF-excitation of a selected gas mixture to create a plasma with the right reactive species to etch any un-masked areas on the wafer surface. The reactions form volatile by-products which are removed by vacuum pumping.
Omega® Etch Systems
SPTS offers advanced etch technologies for a wide range of applications within:
Omega® ICP
SPTS ICP process module is highly flexible and etches a wide range of materials including oxides, nitrides, polymers, low aspect ratio Si and...
Omega® SynapsEtch™
The SPTS Omega® SynapsEtch™ etch process module uses a high density plasma source and is designed to etch strongly...