Intro to HF Release Etch
HF etching is a dry vapor (plasma-less) etch process to remove sacrificial oxide layers, primarily used to release silicon MEMS structures.下载
使用HF或XeF2的干法蒸汽蚀刻用于牺牲硅或氧化层的各向同性蚀刻去除，以具有较高刻蚀选择性和无粘连的方式释放弯曲部分或其他 MEMS 器件。其可提供一系列广泛的速率可控且无残留的刻蚀工艺。
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