Intro to HF Release Etch
HF etching is a dry vapor (plasma-less) etch process to remove sacrificial oxide layers, primarily used to release silicon MEMS structures.
다운로드HF 또는XeF2를 활용하는 건식 증기 식각은 선택성이 향상되고 점착성이 없는 굴곡부 또는 기타 MEMS 소자를 분리하기 위한 희생 실리콘 또는 산화막의 등방성 식각 제거에 사용됩니다. 이는 광범위한 식각 속도 전반에서 잔여물이 없는 제어된 식각을 제공합니다.
증기 박리 기술의 핵심 응용 분야에는 관성 센서, 반사경 배치, 공명기, RF MEMS, 마이크로 액추에이터 및 마이크 등이 포함됩니다
건식 공정으로 Stiction(점착)과 Corrosion(부식)을 제거하기 위해 임계점 건조가 필요하지 않습니다.
넓은 공정 윈도우에서 반복 가능하고 안정적인 성능을 제공 합니다.
금속(특히 노출된 Aluminium mirror와 Bond pads)을 포함한 다양한 장치 재료와 호환됩니다.
낮은 작동압력으로 식각 부산물이 가스 상태에 유지되며, 최대한의 형상 침투와 응축이 발생하지 않도록 합니다. .
대부분의 마스크와 물질에 비해, Si, Ge, Mo 및 SiGe물질에서 선택비가 매우 높은 등방성 식각을 합니다.
매우 얇은 구조에서 Undercut을 손상없이 생성 가능합니다.
저비용의 Photoresist mask를 사용 할 수 있습니다.
Dicing과 Packing 공정이후 MEMS구조를 식각하는데 사용 할 수 있습니다.
건식 공정으로 Stiction(점착) 제거하기 위해 임계점 건조가 필요하지 않습니다.
넓은 공정 윈도우에서 반복 가능하고 안정적인 성능을 제공 합니다.
가스상태의 공정으로 작은 구멍과 공간을 통해 최대한의 형상침투를 보장합니다.
HF etching is a dry vapor (plasma-less) etch process to remove sacrificial oxide layers, primarily used to release silicon MEMS structures.
다운로드XeF2 vapor etching is a highly selective isotropic etch for removing sacrificial layers of Si, Mo or Ge to release MEMS miccrostructures.
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