Via Reveal Processing
High productivity plasma etch processes with unique end-point detection used for post-TSV steps, to prepare the die for connection to other parts of the device.
For advanced 3D-IC applications, SPTS's DeltaTM PECVD system offers low temperature [<175°C] processes compatible with 300mm bonded substrates. Applications include via-last TSV liner and via-reveal passivation.
SPTS is the only PECVD provider who can deposit electrically robust, stable nitride and oxide films at <200°C.
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