LPCVD/Diffusion for Power Devices

SPTS provides highly productive large batch thermal process systems for the fabrication of power semiconductor products on 150, 200 and 300mm wafers.

Benefits of SPTS LPCVD/Diffusion for Power Applications:

  • Highly uniform wet/dry thermal SiO2
  • Large-batch LPCVD TEOS with excellent step coverage
  • >1200°C thermal drive-in annealing
  • Low CoO doped and un-doped gap-fill polysilicon

Related Product Information

LPCVD Product Information