LPCVD/Diffusion for Semiconductor
SPTS offers a variety of large batch thermal processes for memory and logic applications on 150, 200 and 300mm wafers.
Extensive process solutions for LPCVD/diffusion applications include:
- Gate oxides
- Nitrides for gates and spacers
- TEOS spacers and liners
- Phosphorus (P)-and arsenic (As)-doped polysilicon
- Radical oxides
- High Temperature Anneals
- Spin-on-glass low pressure anneal
- Gate and pad oxide
- Cu anneal highly uniform wet/ dry oxides
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